Yuri Granik

Yuri Granik, Artur Balasinski, Valery Axelrad, 2000, Proceedings IEEE 2000 First International Symposium on Quality Electronic Design (Cat. No. PR00525).

Total source mask optimization: high-capacity, resist modeling, and production-ready mask solution

Yuri Granik, Kafai Lai, Kostas Adam, 2011, Photomask Technology.

Analytical approximations of the source intensity distributions

Yuri Granik, Kostas Adam, 2005, SPIE Photomask Technology.

Application of pixel-based mask optimization technique for high transmission attenuated PSM

Yuri Granik, Germain Fenger, Eric Hendrickx, 2009, Advanced Lithography.

Illuminator optimization methods in microlithography

Yuri Granik, Y. Granik, 2004, SPIE Optics + Photonics.

New concepts in OPC

Yuri Granik, Nick Cobb, 2004, SPIE Advanced Lithography.

Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections

Yuri Granik, Uwe Hollerbach, Robert John Socha, 2000 .

OPC methods to improve image slope and process window

Yuri Granik, Nicolas B. Cobb, 2003, SPIE Advanced Lithography.

Physically based compact models for fast lithography simulation

Neal Lafferty, Yuri Granik, Andres Torres, 2004, SPIE Advanced Lithography.

Improved modeling performance with an adapted vectorial formulation of the Hopkins imaging equation

Konstantinos Adam, Yuri Granik, Andres Torres, 2003, SPIE Advanced Lithography.

Failure prediction across process window for robust OPC

Lars W. Liebmann, Yuri Granik, Rama N. Singh, 2003, SPIE Advanced Lithography.

Theory of transformation-invariant compact process modeling

Yuri Granik, Y. Granik, 2019, Photomask Technology.

Model-based insertion and optimization of assist features with application to contact layers

Qingwei Liu, Chi-Yuan Hung, Yuri Granik, 2005, SPIE Photomask Technology.

Calibration and application of a DSA Compact model for graphoepitaxy hole processes using contour-based metrology

Geert Vandenberghe, J. Andres Torres, Yuri Granik, 2014, Photomask Technology.

Analysis of microlithography in an open-architecture TCAD system

Yuri Granik, Valery Axelrad, David Ward, 1994, Advanced Lithography.

Full-chip correction of implant layer accounting for underlying topography

John L. Sturtevant, Aasutosh Dave, Yuri Granik, 2012, Advanced Lithography.

Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture

Geert Vandenberghe, Bruce W. Smith, Yuri Granik, 2009 .

Process window modeling using compact models

Yuri Granik, Thomas Roessler, J. A. Torres, 2004, SPIE Photomask Technology.

Overview and development of EDA tools for integration of DSA into patterning solutions

J. Andres Torres, Joydeep Mitra, Yuri Granik, 2017, 2017 18th International Symposium on Quality Electronic Design (ISQED).

Rigorous CMP and electroplating simulations for DFM applications

Yuri Granik, Norbert Strecker, 2008, SPIE Advanced Lithography.

Full-chip Process Simulation for Silicon DRC

Yuri Granik, Emile Sahouria, Olivier Toublan, 2000 .

New process models for OPC at sub-90-nm nodes

Yuri Granik, Nicolas B. Cobb, 2003, SPIE Advanced Lithography.

Model-assisted complementary double exposure with source optimization

J. Andres Torres, Yuri Granik, 2004, SPIE Photomask Technology.

Calibration of OPC models for multiple focus conditions

Yuri Granik, Jochen Schacht, Wilhelm Maurer, 2004, SPIE Advanced Lithography.

Constraint approaches for some inverse lithography problems with pixel-based mask

Yuri Granik, Alexander Tritchkov, Sergey Kobelkov, 2018, Advanced Lithography.

Fin field effect transistor directionality impacts printing of implantation shapes

Yuri Granik, Xiren Wang, 2018 .

Intensive optimization of masks and sources for 22nm lithography

Kafai Lai, Yuri Granik, Katya Scheinberg, 2009, Advanced Lithography.

Universal process modeling with VTRE for OPC

Thuy Do, Yuri Granik, Nicolas B. Cobb, 2002, SPIE Advanced Lithography.

Model-based OPC using the MEEF matrix

Yuri Granik, Nicolas B. Cobb, 2002, Photomask Technology.

Model-based OPC considering process window aspects: a study

Yuri Granik, Pat LaCour, Ming-Jui Chen, 2002, SPIE Advanced Lithography.

Contrast-based assist feature optimization

Yuri Granik, Andres Torres, Luigi Capodieci, 2002, SPIE Advanced Lithography.

Calibration of compact OPC models using SEM contours

Yuri Granik, 2005, SPIE Photomask Technology.

Application of CM0 resist model to OPC and verification

Yuri Granik, Dmitry Medvedev, Nick Cobb, 2006, SPIE Advanced Lithography.

Correction for etch proximity: new models and applications

Yuri Granik, Y. Granik, 2001, SPIE Advanced Lithography.

Cost and yield estimation in a virtual IC factory

Yuri Granik, Valery Axelrad, Victor V. Boksha, 1994, Advanced Lithography.

Subresolution process windows and yield estimation technique based on detailed full-chip CD simulation

Yuri Granik, Robert John Socha, Emile Sahouria, 2000, SPIE Advanced Lithography.

Fitness and runtime correlation of compact model complexity

Yuri Granik, Monica Kempsell, Alexander N. Drozdov, 2008, SPIE Advanced Lithography.

Intensive 2D SEM model calibration for 45nm and beyond

Ir Kusnadi, Yuri Granik, Thuy Do, 2006, SPIE Advanced Lithography.

Compact model experimental validation for grapho-epitaxy hole processes and its impact in mask making tolerances

J. Andres Torres, Yuri Granik, Germain Fenger, 2014, European Mask and Lithography Conference.

Generalized mask error enhancement factor theory

Yuri Granik, 2005 .

CD variation analysis technique and its application to the study of PSM mask misalignment

Yuri Granik, Nick Cobb, Emile Sahouria, 2001, SPIE Photomask Technology.

On the uniqueness of optical images and solutions of inverse lithographical problems

Yuri Granik, 2009 .

PEB model with cross-diffusion

Yuri Granik, 2003, SPIE Advanced Lithography.

Transformational invariance in compact process modeling

Yuri Granik, Y. Granik, 2020 .

Full-chip-model-based correction of flare-induced linewidth variation

Yuri Granik, Jerome Belledent, James Word, 2004, SPIE Photomask Technology.

Sub-half-micron contact window design with 3D photolithography simulator

Yuri Granik, Douglas A. Bernard, Juan C. Rey, 1997, Advanced Lithography.

Dense OPC for 65nm and below

Yuri Granik, Nicolas B. Cobb, 2005, SPIE Photomask Technology.

Overview and development of EDA tools for integration of DSA into patterning solutions

J. Andres Torres, Joydeep Mitra, Yuri Granik, 2017, 2017 18th International Symposium on Quality Electronic Design (ISQED).

Analytical solutions for the deformation of a photoresist film

Yuri Granik, 2019, Advanced Lithography.

FinFET-induced anisotropy in printing of implantation shapes

Yuri Granik, Xiren Wang, Christian Zuniga, 2017, Advanced Lithography.

Fast pixel-based mask optimization for inverse lithography

Yuri Granik, Y. Granik, 2006 .

Chip-level line-width prediction methodology

Yuri Granik, Pat LaCour, Emile Y. Sahouria, 2002, SPIE Advanced Lithography.

Inverse vs. traditional OPC for the 22nm node

Yuri Granik, Yunfei Deng, Cynthia Zhu, 2009, Advanced Lithography.

Extreme mask corrections: technology and benefits

Yuri Granik, Dmitry Medvedev, Nick Cobb, 2008, SPIE Advanced Lithography.

Hyper-NA imaging of 45nm node random CH layouts using inverse lithography

Geert Vandenberghe, Yuri Granik, Eric Hendrickx, 2008, SPIE Advanced Lithography.

Software in semiconductor manufacturing: peripeteias and prospects (Conference Presentation)

Yuri Granik, 2019 .

Fast rigorous modeling of photoresist in lithography

Yuri Granik, Yunfei Deng, Germain Fenger, 2021, Advanced Lithography.