James P. Blinco

Development of polymers for non-CAR resists for EUV lithography

Andrew K. Whittaker, Idriss Blakey, Michael J. Leeson, 2009, Advanced Lithography.

Polycarbonate based nonchemically amplified photoresists for extreme ultraviolet lithography

Andrew K. Whittaker, Idriss Blakey, Wang Yueh, 2010, Advanced Lithography.

Targeted and modular architectural polymers employing bioorthogonal chemistry for quantitative therapeutic delivery†

Kristofer J. Thurecht, Zachary H. Houston, Nicholas L. Fletcher, 2020, Chemical science.

Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers

Ivan Pollentier, Andrew K. Whittaker, Idriss Blakey, 2011 .

Photoinduced Conjugation of Dithioester- and Trithiocarbonate-Functional RAFT Polymers with Alkenes

James P. Blinco, Christopher Barner-Kowollik, Michael Kaupp, 2011 .

Self-Reporting Fluorescent Step-Growth RAFT Polymers Based on Nitrile Imine-Mediated Tetrazole-ene Cycloaddition Chemistry.

James P. Blinco, Christopher Barner-Kowollik, Thomas Gegenhuber, 2017, ACS macro letters.

Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists

Ivan Pollentier, Andrew K. Whittaker, Idriss Blakey, 2011 .