Kirsten Jean Lawrie

Development of polymers for non-CAR resists for EUV lithography

Andrew K. Whittaker, Idriss Blakey, Michael J. Leeson, 2009, Advanced Lithography.

Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance

Warren Montgomery, Bruce W. Smith, Paul Zimmerman, 2010, Advanced Lithography.

Non-CA resists for 193 nm immersion lithography: effects of chemical structure on sensitivity

Paul Zimmerman, Lan Chen, Andrew K. Whittaker, 2009, Advanced Lithography.

Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers

Ivan Pollentier, Andrew K. Whittaker, Idriss Blakey, 2011 .

Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists

Ivan Pollentier, Andrew K. Whittaker, Idriss Blakey, 2011 .