B. Wright

Comparison of the sputter rates of oxide films relative to the sputter rate of SiO2

M. Engelhard, R. Opila, R. Wallace, 2010 .

Development of low-k precursors for next generation IC manufacturing

R. Opila, Dan Yang, C. Dussarrat, 2012 .

Corrosion of RoHS-Compliant Surface Finishes in Corrosive Mixed Flowing Gas Environments

R. Opila, J. Punch, M. Reid, 2012, Journal of Electronic Materials.

Corrosion of Cu under Highly Corrosive Environments

R. Opila, J. Punch, M. Reid, 2010 .