J. Jauberteau

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Investigations on a nitriding process of molybdenum thin films exposed to (Ar–N2–H2) expanding microwave plasma

P. Goudeau, M. Cahoreau, I. Jauberteau, 2009 .

Langmuir probe in magnetized plasma: Study of the diffusion parameter

O. Cortázar, I. Jauberteau, J. Jauberteau, 2021, Contributions to Plasma Physics.

Langmuir Probe in Non‐Maxwellian Plasma: Correlation Between the Electron Energy Distribution Function, the Ion Energy at the Sheath Edge and the Floating Voltage

I. Jauberteau, J. Jauberteau, 2014 .

Plasma parameters deduced from cylindrical probe measurements: determination of the electron density at the ion saturation current

I. Jauberteau, J. Jauberteau, 2008 .

Synthesis of cyanides in N2–CH4 discharge afterglow

I. Jauberteau, J. Jauberteau, 2018, Journal of Physics D: Applied Physics.

Microwave plasma CVD in the system Si-C-H-Ar : Effect of process parameters

R. Berjoan, J. Jauberteau, M. Ducarroir, 1997 .

Langmuir probe in magnetized plasma: Determination of the electron diffusion parameter and of the electron energy distribution function

O. Cortázar, I. Jauberteau, J. Jauberteau, 2019, Contributions to Plasma Physics.

Time evolution of the electron energy distribution function in pulsed microwave magnetoplasma in H2

O. Cortázar, I. Jauberteau, J. Jauberteau, 2016 .

NH3 and NHx<3 radicals synthesis downstream a microwave discharge sustained in an Ar-N2-H2 gas mixture. Study of surface reactive processes and determination of rate constants

I. Jauberteau, J. Aubreton, J. Jauberteau, 2002 .

Deposition of silicon nitride thin films by reaction of SiH4 in a nitrogen post-discharge

A. Catherinot, M. Baraton, J. Aubreton, 1990 .

Amorphous silicon nitride thin films deposited using d. c. discharge and post-discharge devices

A. Catherinot, M. Baraton, J. Aubreton, 1990 .

Molybdenum Nitride Films: Crystal Structures, Synthesis, Mechanical, Electrical and Some Other Properties

A. Bessaudou, R. Mayet, I. Jauberteau, 2015 .

Determination of the electron energy distribution function in the plasma by means of numerical simulations of multiple harmonic components on a Langmuir probe characteristic—measurements in expanding microwave plasma

I. Jauberteau, J. Jauberteau, 2007 .

Plasma chemistry and diagnostic in an Ar–N2–H2 microwave expanding plasma used for nitriding treatments

I. Jauberteau, J. Aubreton, J. Jauberteau, 2010 .

A reduction–nitridation process of molybdenum films in expanding microwave plasma: Crystal structure of molybdenum nitrides

A. Bessaudou, R. Mayet, I. Jauberteau, 2015 .

Numerical differentiation with noisy signal

F. Jauberteau, J. L. Jauberteau, F. Jauberteau, 2009, Appl. Math. Comput..

Thermal behavior of vanadocene

F. Teyssandier, J. Jauberteau, L. Valade, 1996 .

Comparison of hexamethyldisiloxane dissociation processes in plasma.

I. Jauberteau, J. Jauberteau, 2012, The journal of physical chemistry. A.

Hydrogen Balmer line broadening in Ar-N2-SiH4 DC glow discharge

I. Jauberteau, J. Jauberteau, 2022, Journal of Applied Physics.

High Reactivity of CH2 Radical in an AR–CH4 Post-Discharge

L. Thomas, A. Catherinot, L. Thomas, 1998 .

Microwave Plasma Carburizing

I. Jauberteau, J. Jauberteau, 2016 .

Absolute electron-impact ionization cross sections of free radicals from threshold to 30eV: CHx=2,3, Si(CH3)x=1,2,3, and H2Si(CH3) radicals

I. Jauberteau, J. Aubreton, J. Jauberteau, 2006 .

Argon clusters produced in a nozzle beam at low pressure: Ar2 ionisation cross-section measurement

I. Jauberteau, J. Aubreton, J. Jauberteau, 2004 .

Reaction rate constant for Ar(P2) metastable atoms with the tetramethylsilane molecule

I. Jauberteau, J. Aubreton, J. Jauberteau, 2000 .

Expanding microwave plasma for steel carburizing: Role of the plasma impinging species on the steel surface reactivity

M. J. Cinelli, M. Cahoreau, I. Jauberteau, 2000 .

Characterization of an Ar-TMS microwave discharge using mass spectrometry: effect of the reactor design on free-radical contents

I. Jauberteau, J. Aubreton, J. Jauberteau, 1999 .

Some peculiarities of fracture of nanocrystalline nitride and boride films

G. Kalinnikov, J. Jauberteau, R. Andrievski, 2000 .

Competing growth of titanium nitrides and silicides in Ti thin films processed in expanding microwave plasma: Morphology and microstructural properties

A. Bessaudou, R. Mayet, I. Jauberteau, 2018, AIP Advances.

Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma

D. Mangin, A. Bessaudou, R. Mayet, 2017 .

Spectroscopic study of a D.C. discharge in an argon-silane-nitrogen gas mixture under silicon nitride thin film deposition conditions

J. Jauberteau, C. Girault, D. Duchesne, 1990 .

Expanding Plasma Process for Nitriding Mo–Ti Bilayer Thin Films

D. Mangin, A. Bessaudou, R. Mayet, 2019, Coatings.

Atomic force microscopy investigations on nanoindentation impressions of some metals: effect of piling-up on hardness measurements

M. Nadal, I. Jauberteau, J. Jauberteau, 2008 .

A Thermochemical Process Using Expanding Plasma for Nitriding Thin Molybdenum Films at Low Temperature

A. Bessaudou, I. Jauberteau, T. Merle-Méjean, 2012 .

Expanding microwave plasma process for thin molybdenum films nitriding: Nitrogen diffusion and structure investigations

A. Bessaudou, I. Jauberteau, J. Aubreton, 2011 .

Surface reactivity of molybdenum thin films exposed to (Ar–N2–H2) expanding microwave plasma at low temperature: influence of the addition of H2 gas in the plasma

M. Cahoreau, I. Jauberteau, J. Aubreton, 2005 .

Study of an ArCH4H2 microwave post-discharge under diamond deposition conditions: correlations between analysis performed in the gas phase and in carbon thin films

M. J. Cinelli, L. Thomas, A. Catherinot, 1994 .

Reactivity of methane in a nitrogen discharge afterglow

M. J. Cinelli, I. Jauberteau, J. Aubreton, 2002 .

Microwave plasma enhanced CVD of aluminum oxide films : OES diagnostics and influence of the RF bias

P. Tristant, Z. Ding, J. Jauberteau, 2001 .

Plasma nitriding of thin molybdenum layers at low temperature

M. Semeria, I. Jauberteau, J. Aubreton, 1999 .

Thermal plasma source of hydrogen atoms and ions

Rp Raj Dahiya, D. Schram, J. Jauberteau, 1990 .

Characterization of an argon-hydrogen microwave discharge used as an atomic hydrogen source. Effect of hydrogen dilution on the atomic hydrogen production

L. Thomas, A. Catherinot, L. Thomas, 1997 .

Electrostatic probe measurements in an expanding microwave discharge sustained in an Ar–N2–H2 gas mixture: Investigation on plasma parameters

I. Jauberteau, J. Aubreton, J. Jauberteau, 2004 .

Electrostatic waves in plasma: the case of an expanding microwave plasma sustained in argon

I. Jauberteau, J. Jauberteau, 2014 .

Electron energy distribution function in a pulsed 2.45GHz hydrogen magnetoplasma: Study of the decay

O. Cortázar, I. Jauberteau, J. Jauberteau, 2017 .

Designing Resonance Microwave Cavities to Optimize Plasma Generation

Osvaldo Daniel Cortázar, A. Megía-Macías, Elena Barrios-Diaz, 2020, IEEE Transactions on Instrumentation and Measurement.

Effect of the electron energy distribution function in plasma on the Bohm criterion and on the drop voltage through the sheath: Case of microwave expanding plasma

I. Jauberteau, J. Jauberteau, 2009 .

Comments on the Bohm Criterion and on the Determination of the Ion Velocity at the Sheath Edge in Non‐Maxwellian Plasma

I. Jauberteau, J. Jauberteau, 2011 .

Floating double probe in non‐Maxwellian plasmas: Determination of the electron density and mean electron energy

I. Jauberteau, J. Jauberteau, 2018 .

Determination of the electron density in plasma by means of a floating double probe.

I. Jauberteau, J. Jauberteau, 2008, The Review of scientific instruments.

Electron energy distribution function in plasma determined using numerical simulations of multiple harmonic components on Langmuir probe characteristic: efficiency of the method.

I. Jauberteau, J. Jauberteau, 2007, The Review of scientific instruments.

Measurement of rate constants between atomic nitrogen and silane in a nitrogen discharge afterglow

I. Jauberteau, J. Aubreton, J. Jauberteau, 2000 .

Mass spectrometer analysis of plasma containing easily dissociated species: Absolute concentrations

I. Jauberteau, J. Aubreton, J. Jauberteau, 2007 .

Intermediate species in a 2.45 GHz microwave plasma sustained in an argon–tetramethylsilane gas mixture

I. Jauberteau, J. Aubreton, J. Jauberteau, 2003 .

Initial stages in the growth of carbon films produced in an Ar–CH4–H2 microwave discharge: Composition and surface layers morphology

M. J. Cinelli, L. Thomas, A. Catherinot, 1996 .

Dielectric properties in microwave remote plasma sustained in argon: Expanding plasma conditions

I. Jauberteau, J. Jauberteau, 2012 .

A spatially resolved plasma diagnostic in an expanding microwave discharge containing an Ar- gas mixture: uniformity and stability of the discharge

M. J. Cinelli, I. Jauberteau, J. Aubreton, 1999 .

Characterization of a microwave plasma jet containing Ar‐CH4 gas mixture

M. J. Cinelli, L. Thomas, A. Catherinot, 1994 .

Determination of the electron energy distribution function in weakly ionized plasma by means of a Langmuir probe and numerical methods

I. Jauberteau, J. Jauberteau, 2024, AIP Advances.