Chi-Min Yuan

发表

Cost of ownership reduction for OPC development and production

Kevin D. Lucas, Robert Boone, Alfred J. Reich, 2004, SPIE Advanced Lithography.

Hotspot detection and design recommendation using silicon calibrated CMP model

Xiang Hua, Song Li, Vikas Mehrotra, 2009, Advanced Lithography.

Convergent automated chip level lithography checking and fixing at 45nm

Philippe Hurat, Valerio Perez, Bala Kasthuri, 2009, Advanced Lithography.

Intensity optimization for phase-shifting masks

Kevin D. Lucas, Andrzej J. Strojwas, Chi-Min Yuan, 1993, Advanced Lithography.

Combining OPC and design for printability into 65-nm logic designs

Kevin D. Lucas, Jonathan L. Cobb, Robert Boone, 2004, SPIE Advanced Lithography.

Automatic proximity correction for 0.35 /spl mu/m I-line photolithography

Joseph G. Garofalo, Oberdan W. Otto, Chi-Min Yuan, 1994, Proceedings of International Workshop on Numerical Modeling of processes and Devices for Integrated Circuits: NUPAD V.

Efficient workstation-based 3D model for optical alignment simulation

Andrzej J. Strojwas, Kevin D. Lucas, Chi-Min Yuan, 1996, Advanced Lithography.

Efficient numerical simulation of high-NA i-line lithography processes

Chi-Min Yuan, Nicholas K. Eib, Steve Seiichi Miura, 1992, Advanced Lithography.

Process, design and optical proximity correction requirements for the 65nm device generation

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

Rigorous and practical vector model for phase-shifting masks in optical lithography

Kevin D. Lucas, Andrzej J. Strojwas, Chi-Min Yuan, 1992, Advanced Lithography.

Efficient design of guard rings and antenna diodes to improve manufacturability of FDSOI circuits

Chi-Min Yuan, Dave Tipple, 2020 .

Practical implementation of via and wire optimization at the SoC level

Kevin Wu, Chi-Min Yuan, Bob Jarvis, 2009, Advanced Lithography.

Process sizing aware flow for yield calculation

Chi-Min Yuan, 2010, Advanced Lithography.

Efficient and Rigorous 3D Model for Optical Lithography Simulation

Andrzej J. Strojwas, Kevin D. Lucas, Chi-Min Yuan, 1995 .

Automated optical proximity correction: a rules-based approach

Christophe Pierrat, Sheila Vaidya, Joseph G. Garofalo, 1994, Advanced Lithography.

Model-based design improvements for the 100-nm lithography generation

Matthew A. Thompson, Sergei V. Postnikov, Karl Wimmer, 2002, SPIE Advanced Lithography.

Predicting compute resource usage

Chi-Min Yuan, Robert Boone, Al Reich, 2004 .

A primer of physical design for lithographers

Chi-Min Yuan, 2012, Advanced Lithography.

Embedded attenuating phase-shift mask: printability of defects

Greg P. Hughes, Alvina M. Williams, Ronald M. Martino, 1995, Photomask Technology.

Optimizing standard cell design for quality

Chi-Min Yuan, Dave Tipple, Jeff L. Warner, 2014, Advanced Lithography.

Logic design for printability using OPC methods

Kevin Lucas, Karl Wimmer, Olivier Toublan, 2006, IEEE Design & Test of Computers.

Modeling of optical alignment and metrology schemes used in integrated circuit manufacturing

Andrzej J. Strojwas, Chi-Min Yuan, A. Strojwas, 1990, Advanced Lithography.

Modeling Of Optical Alignment Images For Semiconductor Structures

Chi-Min Yuan, Jerry Shaw, William D. Hopewell, 1989, Advanced Lithography.

Predicting computer resource usage

Robert Boone, Alfred J. Reich, Chi-Min Yuan, 2004, SPIE Photomask Technology.

Modeling optical microscope images of integrated circuit structures

Andrzej J. Strojwas, Chi-Min Yuan, A. Strojwas, 1991 .

A Fast 2D Numerical Algorithm for Photolithography Applications

Chi-Min Yuan, 1992, NUPAD IV. Workshop on Numerical Modeling of Processes and Devices for Integrated Circuits,.