V. Pallem

Physical Analysis of VO2 Films Grown by Atomic Layer Deposition and RF Magnetron Sputtering

Corbet S. Johnson, H. Baumgart, T. Adam, 2014 .

Poster: Memristive Systems

Ho Won Jang, Jason P. Campbell, Jun Yeong Seok, 2013 .

Direct-Liquid-Injection Chemical Vapor Deposition of Nickel Nitride Films and Their Reduction to Nickel Films

R. Gordon, Huazhi Li, Zhefeng Li, 2010 .

Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition

Min Kyu Kim, David Thompson, Hyungjun Kim, 2011 .

Novel Heteroleptic Precursors for Atomic Layer Deposition of TiO2

M. Ritala, M. Leskelä, M. Gavagnin, 2012 .

Synthesis of VO2 Thin Films by Atomic Layer Deposition with TEMAV as Precursor

H. Baumgart, W. Cao, C. Dussarrat, 2013 .

Impact of hydrofluorocarbon molecular structure parameters on plasma etching of ultra-low-K dielectric

G. Oehrlein, Chen Li, Rahul Gupta, 2016 .

Molecular mechanisms of atomic layer etching of cobalt with sequential exposure to molecular chlorine and diketones.

R. Opila, A. Teplyakov, Chuan He, 2019, Journal of vacuum science & technology. A, Vacuum, surfaces, and films : an official journal of the American Vacuum Society.

Atomic layer deposition, characterization, and growth mechanistic studies of TiO2 thin films.

M. Ritala, M. Leskelä, M. Gavagnin, 2014, Langmuir : the ACS journal of surfaces and colloids.

Atomic layer deposition and characterization of vanadium oxide thin films

Mikko Heikkilä, Mikko Ritala, M. Ritala, 2013 .

Nondestructive compositional depth profiling using variable‐kinetic energy hard X‐ray photoelectron spectroscopy and maximum entropy regularization

J. Woicik, R. Opila, J. Krajewski, 2014 .