K. Ronse

发表

R. Rooyackers, W. Sansen, S. Decoutere, 2003, ESSDERC '03. 33rd Conference on European Solid-State Device Research, 2003..

Geert Hellings, Julien Ryckaert, Pieter Weckx, 2021, Photomask Technology.

Kurt G. Ronse, Ivan Pollentier, Grozdan Grozev, 1999, Advanced Lithography.

F. V. Roey, A. Goethals, R. Jonckheere, 2003 .

G. Vandenberghe, M. Maenhoudt, I. Pollentier, 2001 .

Brid Connolly, Gaoliang Dai, Ilan Englard, 2018, Metrology, Inspection, and Process Control for Microlithography XXXII.

Kurt G. Ronse, Young-Chang Kim, Geert Vandenberghe, 2002, SPIE Advanced Lithography.

Kurt G. Ronse, Rik Jonckheere, Leonardus H. A. Leunissen, 2003 .

R. Watso, U. Okoroanyanwu, A. Goethals, 2004 .

Diederik Verkest, Kurt G. Ronse, Jae Uk Lee, 2018, Advanced Lithography.

Diederik Verkest, Kurt G. Ronse, Aaron Thean, 2015, Advanced Lithography.

Geert Vandenberghe, Diederik Verkest, Naoto Horiguchi, 2014, Advanced Lithography.

E. Beyne, N. Horiguchi, I. Radu, 2020, 2020 IEEE International Electron Devices Meeting (IEDM).

Anne-Marie Goethals, Kurt G. Ronse, Monique Ercken, 1999, Advanced Lithography.

R. Rooyackers, M. Van Hove, K. Ronse, 2004, IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004..

E. Hendrickx, V. Philipsen, S. De Gendt, 2023, Advanced Lithography.

R. Rajagopalan, K. Ronse, S. Locorotondo, 2009, 2009 IEEE International Electron Devices Meeting (IEDM).