Benjamin Bunday

发表

Litho-metrology challenges for the 45-nm technology node and beyond

Ndubuisi G. Orji, Mike Bishop, Pete Lipscomb, 2006, SPIE Advanced Lithography.

Toward accurate feature shape metrology

Ndubuisi G. Orji, Ronald G. Dixson, Benjamin Bunday, 2008, SPIE Advanced Lithography.

A Systematic Approach toAccurate Evaluation ofCD-Metrology Tools

Ronald G. Dixson, Benjamin Bunday, Ndubuisi G. Orjil, 2007 .

Scatterometry for EUV lithography at the 22-nm node

Warren Montgomery, Xiaoping Liu, Cecilia Montgomery, 2011, Advanced Lithography.

Gaps analysis for CD metrology beyond the 22nm node

Aaron Cordes, Benjamin Bunday, Thomas A. Germer, 2013, Advanced Lithography.

Enabling inspection solutions for future mask technologies through the development of massively parallel E-Beam inspection

Stefan Wurm, Vibhu Jindal, Jan Hendrik Peters, 2015, European Mask and Lithography Conference.

Automated CD-SEM recipe creation: a new paradigm in CD-SEM utilization

Shunsuke Koshihara, Lorena Page, Benjamin Bunday, 2006, SPIE Advanced Lithography.

Patterned defect and CD metrology by TSOM beyond the 22-nm node

Benjamin Bunday, Ravikiran Attota, Victor Vartanian, 2012, Advanced Lithography.

Implementation of Reference Measurement System using CD-AFM

Marylyn Hoy Bennett, Ronald G. Dixson, Theodore V. Vorburger, 2003, SPIE Advanced Lithography.

Massively parallel E-beam inspection: enabling next-generation patterned defect inspection for wafer and mask manufacturing

Stefan Wurm, Jan Hendrik Peters, Matt Malloy, 2015, Advanced Lithography.

Use of TSOM for sub-11nm node pattern defect detection and HAR features

Benjamin Bunday, Ravikiran Attota, Abraham Arceo, 2013, Advanced Lithography.

Realizing value-added metrology

Bryan J. Rice, Pete Lipscomb, Dilip Patel, 2007, SPIE Advanced Lithography.

Measurement traceability and quality assurance in a nanomanufacturing environment

Ndubuisi G. Orji, Ronald G. Dixson, Aaron Cordes, 2011 .

Implementation of a Reference Measurement System Using CD-AFM | NIST

Marylyn Hoy Bennett, Theodore V. Vorburger, Ronald G. Dixson, 2003 .

HVM metrology challenges towards the 5nm node

Benjamin Bunday, B. Bunday, 2016, SPIE Advanced Lithography.

Small feature accuracy challenge for CD-SEM metrology physical model solution

Ofer Adan, Sergey Latinski, Benjamin Bunday, 2006, SPIE Advanced Lithography.

Results of benchmarking of advanced CD-SEMs at the 90-nm CMOS technology node

John A. Allgair, Michael Bishop, Benjamin Bunday, 2004, SPIE Advanced Lithography.

Specifications and methodologies for benchmarking of advanced CD-SEMs at the 90-nm CMOS technology node and beyond

Michael Bishop, Benjamin Bunday, 2003, SPIE Advanced Lithography.

NEW scanning electron microscope magnification calibration reference material (RM) 8820

John Allgair, William Keery, Benjamin Bunday, 2010, Scanning Microscopies.

Towards Accurate Feature Shape Metrology | NIST

Ndubuisi G. Orji, Ronald G. Dixson, John A. Allgair, 2008 .

Measurement traceability and quality assurance in a nanomanufacturing environment

Ronald G. Dixson, Aaron Cordes, Benjamin Bunday, 2009, NanoScience + Engineering.

Specifications, methodologies, and results of evaluation of optical critical dimension scatterometer tools at the 90nm CMOS technology node and beyond

John Allgair, Benjamin Bunday, Amy Peterson, 2005, SPIE Advanced Lithography.

Major trends in extending CD-SEM utility

Shunsuke Koshihara, Lorena Page, Benjamin Bunday, 2007, SPIE Advanced Lithography.

Improving optical measurement accuracy using multi-technique nested uncertainties

Hui Zhou, Bryan M. Barnes, Ronald G. Dixson, 2009, Advanced Lithography.

Benchmarking of advanced CD-SEMs at the 130-nm CMOS technology node

Michael Bishop, Benjamin Bunday, 2002, SPIE Advanced Lithography.