C. Vorst

IVB-1 electrical properties of thin oxides (80-90 Å) processed by a two-step oxidation treatment

A. Bhattacharyya, A. Carim, C. Vorst, 1985, IEEE Transactions on Electron Devices.

High-Resolution Electron Microscopy and Scanning Tunneling Microscopy of Native Oxides on Silicon

C. Quate, R. Sinclair, M. Dovek, 1987, Science.

Effect of addition of TCA (trichloroethane) on the electrical properties of thin oxides processed by a two-step oxidation technique

A. Bhattacharyya, C. Vorst, 1986 .

Gettering of copper in silicon-on-insulator structures formed by oxygen ion implantation

M. Delfino, C. Vorst, A. E. Morgan, 1987 .

A Two‐Step Oxidation Process to Improve the Electrical Breakdown Properties of Thin Oxides

A. H. Carim, A. Bhattacharyya, Anjan Bhattacharyya, 1985 .