S. Voight

Crystalline oxide-based devices on silicon substrates

R. Droopad, J. Finder, Z. Yu, 2003 .

Progress in Epitaxial Oxides on Semiconductors

Hao Li, J. Curless, R. Droopad, 2002 .

Epitaxial PbZr.52Ti.48O3 films on SrTiO3/(001)Si substrates deposited by sol–gel method

J. Curless, A. Talin, J. Finder, 2002 .

Nitrogen-doped plasma enhanced chemical vapor deposited (PECVD) amorphous carbon: processes and properties

A. Talin, H. Tompkins, Steven M. Smith, 2001 .

HfO2 Gate Dielectrics Deposited via Tetrakis Diethylamido Hafnium

M. Ramon, Bich-Yen Nguyen, R. Nieh, 2003 .

Improved adhesion of photoresist to III-V substrates using PECVD carbon films

A. Alec Talin, Steven M. Smith, Steven A. Voight, 2002, SPIE Advanced Lithography.