H. Spahr

Conduction mechanisms in thin atomic layer deposited Al2O3 layers

W. Kowalsky, H. Johannes, H. Spahr, 2013 .

Regimes of leakage current in ALD-processed Al2O3 thin-film layers

W. Kowalsky, H. Johannes, H. Spahr, 2013 .

Enhancement of the maximum energy density in atomic layer deposited oxide based thin film capacitors

D. Hente, W. Kowalsky, H. Johannes, 2013 .

Impact of morphological defects on the electrical breakdown of ultra thin atomic layer deposition processed Al2O3 layers

W. Kowalsky, S. Hamwi, H. Johannes, 2013 .

Breakdown in ALD-processed oxide based thin film structures

W. Kowalsky, S. Hamwi, H. Johannes, 2013 .