文
论文分享
演练场
杂货铺
论文推荐
字
编辑器下载
登录
注册
Rudra Kumar
发表
All-new nickel-based Metal Core Organic Cluster (MCOC) resist for N7+ node patterning
Satinder K. Sharma, Kenneth E. Gonsalves, Rudra Kumar, 2020, Advanced Lithography.