Chullikkattil P. Pradeep

发表

All-new nickel-based Metal Core Organic Cluster (MCOC) resist for N7+ node patterning

Satinder K. Sharma, Kenneth E. Gonsalves, Rudra Kumar, 2020, Advanced Lithography.

Organic-inorganic hybrid resists for EUVL

Subrata Ghosh, Satinder K. Sharma, V. S. V. Satyanarayana, 2014, Advanced Lithography.

Helium ion active hybrid non-chemically amplified resist (n-CAR) for sub-10 nm patterning applications

Subrata Ghosh, Satinder K. Sharma, Kenneth E. Gonsalves, 2018, Advanced Lithography.

Evaluation of high-resolution and sensitivity of n-CAR hybrid resist for sub-16nm or below technology node

Subrata Ghosh, Satinder K. Sharma, Kenneth E. Gonsalves, 2018, Advanced Lithography.

New polyoxometalates containing hybrid polymers and their potential for nano-patterning.

Subrata Ghosh, V. S. V. Satyanarayana, Kenneth E. Gonsalves, 2015, Chemistry.

A hybrid polymeric material bearing a ferrocene-based pendant organometallic functionality: synthesis and applications in nanopatterning using EUV lithography

Subrata Ghosh, V. S. V. Satyanarayana, Kenneth E. Gonsalves, 2014 .

Intramolecular hydrogen transfer in (S)‐2‐[(1‐benzyl‐2‐hydroxyethylimino)methyl]‐4‐nitrophenol, a new chiral Schiff base

Chullikkattil P. Pradeep, 2005 .

Recent advances in non-chemically amplified photoresists for next generation IC technology

Subrata Ghosh, Kenneth E. Gonsalves, Chullikkattil P. Pradeep, 2016 .

Programmable Surface Architectures Derived from Hybrid Polyoxometalate-Based Clusters

Leroy Cronin, Haralampos N. Miras, Chullikkattil P. Pradeep, 2011 .

Design, development, EUVL applications and nano mechanical properties of a new HfO2 based hybrid non-chemically amplified resist

Subrata Ghosh, Kenneth E. Gonsalves, Chullikkattil P. Pradeep, 2016 .