Joshua S. Hooge

A multi-tiered approach to 193-nm immersion defect reduction through track process adjustments

Eugenia Ng, Joshua S. Hooge, 2007, SPIE Advanced Lithography.

Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern

Ivan Pollentier, Roel Gronheid, Kathleen Nafus, 2012 .

EUV secondary electron blur at the 22nm half pitch node

Carlos Fonseca, John J. Biafore, Roel Gronheid, 2011, Advanced Lithography.

Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node

Joshua S. Hooge, C. Fonseca, K. Nafus, 2011 .

Resolution–linewidth roughness–sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist

Joshua S. Hooge, A. V. Pret, B. Rathsack, 2011 .

EUV RLS performance tradeoffs for a polymer bound PAG resist

Alessandro Vaglio Pret, Roel Gronheid, Kathleen Nafus, 2010, Advanced Lithography.

Comparison of directed self-assembly integrations

Roel Gronheid, Kathleen Nafus, Paul Nealey, 2012, Other Conferences.