J. Levert

Model of Particle Contact Area for Friction in Oxide Chemical Mechanical Polishing

C. Korach, J. Levert, Benjamin Mooney, 2019, ECS Journal of Solid State Science and Technology.

Mechanism for Subambient Interfacial Pressures While Polishing With Liquids

Steven Danyluk, John A. Tichy, S. Danyluk, 2000 .

Contact Mechanics and Lubrication Hydrodynamics of Chemical Mechanical Polishing

Steven Danyluk, John A. Tichy, S. Danyluk, 1999 .

CMP Friction as a Function of Slurry Silica Nanoparticle Concentration and Diameter

C. Korach, J. Levert, 2009 .

Interfacial Fluid Mechanics and Pressure Prediction in Chemical Mechanical Polishing

Steven Danyluk, John A. Tichy, S. Danyluk, 2000 .

Mechanisms of chemical-mechanical polishing of SiO2 dielectric on integrated circuits©

Richard F. Salant, Steven Danyluk, R. F. Salant, 1998 .