Yongmei Chen

发表

Demonstration of 32nm half-pitch electrical testable NAND FLASH patterns using self-aligned double patterning

Ping Xu, Huixiong Dai, Chris Ngai, 2009, Advanced Lithography.

Advances in cell‐based biosensors using three‐dimensional cell‐encapsulating hydrogels

Feng Xu, Tianjian Lu, Jinhui Wu, 2011, Biotechnology journal.

Self-aligned double patterning process for 32/32nm contact/space and beyond using 193 immersion lithography

Mehul Naik, James Yu, Christopher Dennis Bencher, 2010, Advanced Lithography.

Implementing self-aligned double patterning on non-gridded design layouts

Huixiong Dai, Chris Ngai, Jason Sweis, 2009, Advanced Lithography.

Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab

William D. Hinsberg, Chris Bencher, Hoa D. Truong, 2011, Advanced Lithography.

Spatial frequency multiplication techniques towards half-pitch 10nm patterning

Ping Xu, Hao Chen, Chris Ngai, 2011, Advanced Lithography.

RET application in 45-nm node and 32-nm node contact hole dry ArF lithography process development

Chris Ngai, Christopher Dennis Bencher, Xiangqun Miao, 2007, SPIE Advanced Lithography.

Post-litho line edge/width roughness smoothing by ion implantations

Peng Xie, Huixiong Dai, Chris Ngai, 2013, Advanced Lithography.

Sidewall spacer quadruple patterning for 15nm half-pitch

Ping Xu, Chris Ngai, Yijian Chen, 2011, Advanced Lithography.

Decomposition strategies for self-aligned double patterning

Yunfei Deng, Harry J. Levinson, Huixiong Dai, 2010, Advanced Lithography.

45nm and 32nm half-pitch patterning with 193nm dry lithography and double patterning

Huixiong Dai, Chris Ngai, Christopher Dennis Bencher, 2008, SPIE Advanced Lithography.

Challenges of 29nm half-pitch NAND Flash STI patterning with 193nm dry lithography and self-aligned double patterning

Chris Ngai, Benjamin Szu-Min Lin, Amiad Conley, 2008, Lithography Asia.

Recessive self-aligned double patterning with gap-fill technology

Hao Chen, Chris Ngai, Yijian Chen, 2011, Advanced Lithography.

Self-aligned triple patterning for continuous IC scaling to half-pitch 15nm

Ping Xu, Chris Ngai, Yijian Chen, 2011, Advanced Lithography.

22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP)

Warren Montgomery, Huixiong Dai, Christopher Dennis Bencher, 2008, SPIE Advanced Lithography.

Photoinduced anisotropy and high-efficiency optical storage in azobenzene side-chain polymer

Encai Hao, Yanqiang Yang, Qingxin Yang, 1998, Other Conferences.

Alignment and overlay improvements for 3x nm and beyond process with CVD sidewall spacer double patterning

Huixiong Dai, Chris Ngai, Christopher Dennis Bencher, 2009, Advanced Lithography.

Innovative self-aligned triple patterning for 1x half pitch using single "spacer deposition-spacer etch" step

Ping Xu, Christopher Dennis Bencher, Yongmei Chen, 2011, Advanced Lithography.

Small particle defect characterization on critical layers of 22nm Spacer Self-Aligned Double Patterning (SADP)

Chris Ngai, Saar Shabtay, Kfir Dotan, 2012, Advanced Lithography.