S. Suh

发表

Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor

C. Hwang, S. Kim, Seongjae Cho, 2016 .

High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal–Organic Silicon Precursor and Oxygen Radical

H. Kim, Seok-jun Won, M. Huh, 2010, IEEE Electron Device Letters.

Investigation on spatially separated atomic layer deposition by gas flow simulation and depositing Al2O3 films

C. Hwang, H. Kim, Seok-jun Won, 2012 .

Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas

C. Hwang, G. Choi, Sang Woon Lee, 2010 .

Improving the electrical properties of lanthanum silicate films on ge metal oxide semiconductor capacitors by adopting interfacial barrier and capping layers.

C. Hwang, H. Kim, J. H. Lee, 2014, ACS applied materials & interfaces.

Effect of catalyst layer density and growth temperature in rapid atomic layer deposition of silica using tris(tert-pentoxy)silanol.

C. Hwang, N. Lee, H. Kim, 2011, ACS applied materials & interfaces.

Zirconium-assisted reaction in low temperature atomic layer deposition using Bis(ethyl-methyl-amino)silane and water

H. Kim, Seok-jun Won, Y. Choi, 2011 .

Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma

Jaeyeong Heo, H. Kim, Seok-jun Won, 2013 .

Reduction in the Interfacial Trap Density of Al2O3/GaAs Gate Stack by Adopting High Pressure Oxidation

Jae Kyeong Jeong, N. Lee, H. Kim, 2014 .

Growth and electrical properties of silicon oxide grown by atomic layer deposition using Bis(ethyl-methyl-amino)silane and ozone

C. Hwang, N. Lee, H. Kim, 2012 .