A. Bykanov

Development of stable extreme-ultraviolet sources for use in lithography exposure systems

I. Fomenkov, N. Farrar, N. Bowering, 2012 .

Refractive tunnel keratoplasty with synthetic implants modified by a gas-discharge plasma.

E. Eliseeva, A. Bykanov, Y. Shusterov, 2001, Artificial organs.

Performance summary on a high power dense plasma focus x-ray lithography point source producing 70 nm line features in AlGaAs microcircuits

J. Mangano, A. Bykanov, R. Petr, 2004 .

LPP EUV source development for HVM

Igor V. Fomenkov, Alex I. Ershov, William N. Partlo, 2006, SPIE Advanced Lithography.

Spectral diagnostics of inductively coupled RF discharge plasma

A. Bykanov, I. Abdullin, I. Gafarov, 2012, High Energy Chemistry.

LPP EUV source development for HVM

Igor V. Fomenkov, Alex I. Ershov, William N. Partlo, 2006, SPIE Advanced Lithography.

Characterization of plasma emission in the 1-6 nm band from laser-irradiated cryogenic xenon targets

O. Khodykin, M. Tillack, C. McGuffey, 2019, Journal of Applied Physics.

Liquid metal micro-droplet generator for laser produced plasma target delivery used in an extreme ultra-violet source

Alexander N. Bykanov, Oscar Hemberg, J. Martin Algots, 2005, SPIE Advanced Lithography.