H. Itoh

发表

Polymerization to graphite‐like nitride clusters from tetracyanoethylene vapor

Y. Ueda, H. Yanagi, H. Itoh, 1994 .

Two-Body Dirac Equation and Its Wave Function at the Origin(Recent Developments in QCD and Hadron Physics)

H. Itoh, 1997 .

Low dielectric constant insulator formed by downstream plasma CVD at room temperature using TMS/O2

H. Itoh, A. Nara, 1997 .

Separation and determination of copper(II) and iron(II) as their monothiothenoyltrifluoroacetone complexes with pyridine by extraction spectrophotometry and reversed-phase thin-layer chromatography

H. Itoh, T. Kiba, Yoshino Fujioka, 1977 .

Plasma-enhanced chemical vapour deposition of AlN coatings on graphite substrates

H. Itoh, K. Sugiyama, M. Kato, 1987 .

Formation of TiN barrier films at the bottom of contact holes by Ionized Cluster Beam

M. Hanai, H. Ishii, H. Itoh, 1994 .

High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System

M. Hori, Y. Kubota, K. Takeda, 2013 .

Study of the SiO2/Si interface using spectroscopic ellipsometry and x-ray reflectometry

Y. Mitani, H. Satake, H. Itoh, 2002 .

Adhesion and Cu Diffusion Barrier Properties of a MnO x Barrier Layer Formed with Thermal MOCVD

Kenji Matsumoto, K. Neishi, J. Koike, 2009 .

Predictable topography simulation of SiO2 etching by C5F8 gas combined with a plasma simulation, sheath model and chemical reaction model

S. Takagi, S. Onoue, K. Iyanagi, 2003 .

Optimum partial pressure of cesium over negative electron affinity surface of GaP‐Cs

H. Itoh, M. Hagino, M. Miyao, 1984 .

Cathodoluminescence characterization of dislocations in gallium nitride using a transmission electron microscope

James S. Speck, Shuji Nakamura, Umesh K. Mishra, 2003 .

Characteristics of an atmospheric-pressure line plasma excited by 2.45 GHz microwave travelling wave

M. Hori, M. Sekine, H. Toyoda, 2015 .

Tungsten Photochemical Vapor Deposition Mechanism in WF6+H2 System I. Adspecies Excitation Model

T. Moriya, H. Itoh, M. Toyama, 1986 .

Suppression of stress-induced leakage current after Fowler-Nordheim stressing by deuterium pyrogenic oxidation and deuterated poly-Si deposition

A. Toriumi, Y. Mitani, H. Satake, 2002 .

Formation of a manganese oxide barrier layer with thermal chemical vapor deposition for advanced large-scale integrated interconnect structure

Hitoshi Itoh, Hiroshi Sato, Junichi Koike, 2008 .

Mechanism for Initial Stage of Selective Tungsten Growth Employing a WF6 and SiH4 Mixture

Toru Watanabe, H. Itoh, Naruhiko Kaji, 1991 .

A study of atomically-flat SiO 2 /Si interface formation mechanism, based on the radical oxidation kinetics

A. Toriumi, M. Nagaminé, H. Satake, 1999 .

Effects of Water Desorption from SiO2 Substrates on the Thickness of Manganese Oxide Diffusion Barrier Layer Formed by Chemical Vapor Deposition

Kenji Matsumoto, K. Neishi, J. Koike, 2010 .

Chemical Vapor Deposition of Mn and Mn Oxide and their Step Coverage and Diffusion Barrier Properties on Patterned Interconnect Structures

Hitoshi Itoh, Hiroshi Sato, Junichi Koike, 2009 .

Effect of Underlayers on the Morphology and Orientation of Aluminum Films Prepared by Chemical Vapor Deposition Using Dimethylaluminumhydride

Y. Shimogaki, H. Komiyama, M. Sugiyama, 1999 .

Flow-injection amperometric biosensing of copper(II) ions using a contact-type of an apoenzyme sensor

I. Satoh, H. Itoh, H. Anzai, 1992 .

Development of the ultra-high-sensitive Kr adsorption technique to evaluate the pore-size distribution of thin-film materials

K. Nakai, H. Itoh, H. Yanazawa, 2002 .

New line plasma source excited by 2.45 GHz microwave at atmospheric pressure

M. Hori, M. Sekine, H. Toyoda, 2015 .

Radical oxygen (O/sup */) process for highly-reliable SiO/sub 2/ with higher film-density and smoother SiO/sub 2//Si interface

A. Toriumi, H. Satake, A. Toriumi, 1998, International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217).