Dail Eom

发表

Influence of Hydrogen Plasma Treatment and Post-Annealing on Defects in 4H-SiC

H. Kim, M. Um, I. Jeon, 2004 .

Properties of lanthanum oxide thin films deposited by cyclic chemical vapor deposition using tris(isopropyl-cyclopentadienyl)lanthanum precursor

C. Hwang, H. Kim, Dail Eom, 2006 .

The Role of the Methyl and Hydroxyl Groups of Low-k Dielectric Films on the Nucleation of Ruthenium by ALD

C. Hwang, Sang Young Lee, Jaeyeong Heo, 2008 .

Changes in structures and electrical conduction mechanisms of chemical vapor deposited Ta2O5 thin films by annealing under O3 atmosphere with ultraviolet light radiation

C. Hwang, H. Kim, I. Jeon, 2004 .

UV-O3 treatment effects on structural changes of low-k thin films

Jaeyeong Heo, H. Kim, Dail Eom, 2007 .

Enhanced Nucleation Behavior of Atomic-Layer-Deposited Ru Film on Low-k Dielectrics Afforded by UV-O3 Treatment

C. Hwang, Sang Young Lee, Jaeyeong Heo, 2008 .

Property Changes of Aluminum Oxide Thin Films Deposited by Atomic Layer Deposition under Photon Radiation

C. Hwang, H. Kim, Dail Eom, 2006 .

Properties of Aluminum Nitride Thin Films Deposited by an Alternate Injection of Trimethylaluminum and Ammonia under Ultraviolet Radiation

C. Hwang, H. Kim, Dail Eom, 2006 .

Deposition Characteristics and Annealing Effect of La2O3 Films Prepared Using La ( iPrCp ) 3 Precursor

C. Hwang, H. Kim, Dail Eom, 2007 .

Electrical Properties of the La2O3/4H-SiC Interface Prepared by Atomic Layer Deposition Using La(iPrCp)3 and H2O

Jae Bin Lee, H. Kim, H. Na, 2006 .

Low-Temperature Hydrogen-Plasma Treatment for Defect passivation in 4H-SiC

H. Kim, H. Na, M. Um, 2003 .

Thermal Annealing Effects on the Atomic Layer Deposited LaAlO3 Thin Films on Si Substrate

C. Hwang, K. Chung, M. Cho, 2008 .

Post-Annealing Effects on Fixed Charge and Slow/Fast Interface States of TiN/Al2O3/p-Si Metal–Oxide–Semiconductor Capacitor

Ho-Kyu Kang, C. Hwang, Jong-Ho Lee, 2003 .

Improvement in Thermal Stability of Stacked Structures of Aluminum Nitride and Lanthanum Oxide Thin Films on Si Substrate

C. Hwang, H. Kim, Heechul Park, 2007 .

Electronic Properties of Atomic-Layer-Deposited Al2O3/Thermal-Nitrided SiO2 Stacking Dielectric on 4H SiC

K. Cheong, W. Bahng, N. Kim, 2007 .

Atomic Layer Deposition of Ruthenium Nanoparticles Using a Low-Density Dielectric Film as Template Structure

C. Hwang, Sang Young Lee, Jaeyeong Heo, 2009 .

Electrical Properties of Atomic-Layer-Deposited La2O3/Thermal-Nitrided SiO2 Stacking Dielectric on 4H-SiC(0001)

K. Cheong, W. Bahng, N. Kim, 2007 .