Rex B. Anderson

Optimization of chrome dry etch in Tetra II using asymmetrically loaded patterns

Cynthia B. Brooks, Rex B. Anderson, Jason O. Clevenger, 2003, SPIE Photomask Technology.

Optimization of a 65-nm alternating phase-shift quartz etch process

Scott Alan Anderson, Rex B. Anderson, Jason O. Clevenger, 2003, SPIE Photomask Technology.

Examination of various endpoint methods for chrome mask etch

Scott Alan Anderson, Cynthia B. Brooks, Rex B. Anderson, 2003, SPIE Photomask Technology.

In-situ optical emission spectroscopic examination of chrome etch for photomasks

Yi-Chiau Huang, Rex B. Anderson, Melisa J. Buie, 2002, Photomask Japan.

Optical emission endpoint optimization in the tetra etch chamber for production of embedded phase-shift photomasks

Scott Alan Anderson, Cynthia B. Brooks, Rex B. Anderson, 2003, European Mask and Lithography Conference.

Study of the Role of Cl2, O2, and He in the Chrome Etch Process with Optical Emission Spectroscopy

Rex B. Anderson, Guenther Ruhl, Melisa J. Buie, 2002, Photomask Technology.