M. Wieland

Optimum dose for shot noise limited CD uniformity in electron-beam lithography

Remco Jager, Pieter Kruit, Marco Jan-Jaco Wieland, 2004 .

Non-CAR resists and advanced materials for Massively Parallel E-Beam Direct Write process integration

Pieter Brandt, Isabelle Servin, Ludovic Lattard, 2016, SPIE Advanced Lithography.

Field emission photocathode array for multibeam electron lithography

M. J. Wieland, B. J. Kampherbeek, Pieter Kruit, 2001 .

Cathode ray tube type electron gun as a source for multibeam electron lithography

P. Kruit, M. Wieland, A. V. Veen, 2007 .

Fabrication and characterization of p-type silicon field-emitter arrays for lithography

N. J. Druten, P. Kruit, C. Heerkens, 2005 .

MAPPER: progress toward a high-volume manufacturing system

G. de Boer, R. Jager, E. Slot, 2013, Advanced Lithography.

Fabrication and characterization of Silicon carbide field-emitter array

T. Teepen, P. Kruit, O. Groening, 2004 .

Field emission photocathode array for high throughput lithography

P. Kruit, A.H.V. Van Veen, B.J. Kampherbeek, 2001, IVMC 2001. Proceedings of the 14th International Vacuum Microelectronics Conference (Cat. No.01TH8586).