R. Ditizio

Creation of deep gap states in Si during Cl2 or HBr plasma etch exposures

O. Awadelkarim, S. Fonash, T. Gu, 1993 .

Oxygen based electron cyclotron resonance etching of semiconducting homoepitaxial diamond films

G. Gildenblat, S. Fonash, S. Grot, 1992 .

Electronic Device Fabrication Using Electron Cyclotron Resonance Etching of Boron Doped Homoepitaxial Diamond Films

G. Gildenblat, S. Fonash, S. Grot, 1992 .

Electronic states created in p‐Si subjected to plasma etching: The role of inherent impurities, point defects, and hydrogen

O. Awadelkarim, K. Reinhardt, S. Fonash, 1993 .

Short time electron cyclotron resonance hydrogenation of polycrystalline silicon thin‐film transistor structures

D. Greve, S. Fonash, R. Ditizio, 1990 .

Cell Shape and Patterning Considerations for Magnetic Random Access Memory (MRAM) Fabrication

J. Zhu, R. Ditizio, P. Werbaneth, 2008 .