D. R. Medeiros

发表

Relationship between deprotection and film thickness loss during plasma etching of positive tone chemically amplified resists

A. Mahorowala, D. R. Medeiros, 2001 .

Resists for Mask Making

B. Rathsack, C. Willson, D. R. Medeiros, 2005 .

Poly-Si/high-k gate stacks with near-ideal threshold voltage and mobility

P. Oldiges, K. Maitra, V. Narayanan, 2005, IEEE VLSI-TSA International Symposium on VLSI Technology, 2005. (VLSI-TSA-Tech)..

Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 2004 .

A New High Performance CA Resist for E-beam Lithography

Marie Angelopoulos, David R. Medeiros, Wu-Song Huang, 1999 .

[(CH3)3NCH2CH2NH3]SnI4: a layered perovskite with quaternary/primary ammonium dications and short interlayer iodine-iodine contacts.

D. Mitzi, Zhengtao Xu, D. R. Medeiros, 2003, Inorganic chemistry.

Intercalated organic-inorganic perovskites stabilized by fluoroaryl-aryl interactions.

D. Mitzi, P. Malenfant, D. R. Medeiros, 2002, Inorganic chemistry.

Design of photoresists with reduced environmental impact. II. Water‐soluble resists based on photocrosslinking of poly(2‐isopropenyl‐2‐oxazoline)

C. Willson, J. Fréchet, D. Pasini, 1999 .

Model studies on the photochemistry of phenolic sulfonate photoacid generators

J. Andraos, J. Scaiano, G. Barclay, 1998 .

X-ray diffraction and torsional viscosity investigations of laterally linked SC* liquid crystal dimers

C. Willson, Michael A. Hale, D. R. Medeiros, 1999 .

Laterally Linked Liquid Crystal Dimers with Electrooptic Properties

C. Willson, Michael A. Hale, Jeffrey K. Leitko, 1998 .

Ferroelectric cyclic oligosiloxane liquid crystals

C. Grant Willson, Raymond J. Hung, David R. Medeiros, 1999 .