Chung Chan

Oxide charge accumulation in metal oxide semiconductor devices during irradiation

Der‐Sun Lee, Chung Chan, C. Chan, 1991 .

Investigations of Plasma Immersion Ion Implantation Hydrogenation for Poly-Si Tfts Using an Inductively Coupled Plasma Source

Yuanzhong Zhou, S. Qin, Chung Chan, 1996 .

Microcavities formed by hydrogen or helium plasma immersion ion implantation

N. Cheung, P. Chu, Chung Chan, 1998, 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144).

Oxidation-sharpened gated field emitter array process

K. Warner, Nicol E. McGruer, Chung Chan, 1991 .

Investigation Of The Operating Modes Of Gated Vacuum Field Emitter Arrays To Reduce The Failure Rate

J. Browning, Chung Chan, S. Meassick, 1993, [Proceedings] IVMC '93 Sixth International Vacuum Microelectronics Conference.

Instrumental and process considerations for the fabrication of silicon-on-insulators (SOI) structures by plasma immersion ion implantation

P. Ko, N. Cheung, P. Chu, 1998 .

Plasma ion implantation hydrogenation of poly-Si CMOS thin-film transistors at low energy and high dose rate using an inductively-coupled plasma source

T. King, Yuanzhong Zhou, S. Qin, 1998 .

High dose-rate hydrogen passivation of polycrystalline silicon CMOS TFTs by plasma ion implantation

T. King, S. Qin, Chung Chan, 1996 .

Short-Time Hydrogen Passivation of Poly-Si CMOS Thin film Transistors by High Dose Rate Plasma Ion Implantation

T. King, Yuanzhong Zhou, S. Qin, 1995 .