M. Purushothaman

Adhesion and removal behavior of particulate contaminants from EUV mask materials

Min-Su Kim, Jin-Goo Park, M. Purushothaman, 2017 .

Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents

Young Woong Kim, Jinho Ahn, Min-Su Kim, 2018, Colloids and Surfaces A: Physicochemical and Engineering Aspects.

Study on possible root causes of contamination from an incoming PVA brush during post-CMP cleaning

Jung-Hwan Lee, Jin-Goo Park, Nagendra Prasad Yerriboina, 2019, Polymer Testing.