Eros Huang

Stable E-beam metrology on ArF resist for advanced process control

Chih-Ming Ke, Anthony Yen, Jason C. Yee, 2002, SPIE Advanced Lithography.

Detecting yield-limiting SiGe defects for 28nm ramping

Sam Chen, Mahatma Lin, Eros Huang, 2013, ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference.

Innovative techniques for improving overlay accuracy by using DCM (device correlated metrology) targets as reference

David Tien, Eran Amit, Howard Chen, 2014, Advanced Lithography.

Device-correlated metrology for overlay measurements

Hiroki Kawada, Takeshi Kato, Dongsub Choi, 2014 .

Innovative fast technique for overlay accuracy estimation using archer self calibration (ASC)

David Tien, Eran Amit, Charlie Chen, 2014, Advanced Lithography.

DCM: device correlated metrology for overlay measurements

Hiroki Kawada, Takeshi Kato, Dongsub Choi, 2013, Advanced Lithography.

Multi-level overlay techniques for improving DPL overlay control

David Tien, Dongsub Choi, Robert Wu, 2012, Advanced Lithography.

Techniques for improving overlay accuracy by using device correlated metrology targets as reference

David Tien, Eran Amit, Howard Chen, 2014 .