S. Labau

发表

Mechanism of Spin‐Orbit Torques in Platinum Oxide Systems

S. Auffret, I. Joumard, M. Chshiev, 2021, Advanced Electronic Materials.

Impact of Substrate Biasing During AlN Growth by PEALD on Al2O3/AlN/GaN MOS Capacitors

M. Charles, R. Gwoziecki, C. Le Royer, 2021, Advanced Materials Interfaces.

Controlled SOI nanopatterning for GaN pendeo-epitaxy

M. Charles, G. Feuillet, B. Alloing, 2022, Micro and Nano Engineering.

Influence of substrate biasing on structural, chemical and electrical properties of Al2O3 thin films deposited by PEALD

M. Legallais, B. Salem, F. Bassani, 2022, Semiconductor Science and Technology.

Formation mechanisms of ZnO nanowires on polycrystalline Au seed layers for piezoelectric applications

V. Consonni, B. Salem, E. Sarigiannidou, 2019, Nanotechnology.

Improvement of AlN film quality using plasma enhanced atomic layer deposition with substrate biasing.

G. Ghibaudo, T. Baron, E. Martinez, 2020, ACS applied materials & interfaces.

Chemical Bath Deposition of ZnO Nanowires Using Copper Nitrate as an Additive for Compensating Doping.

V. Consonni, B. Salem, X. Baillin, 2021, Inorganic chemistry.

Study and development of polymer destabilization by Capillary NIL

C. Masclaux, C. Gourgon, C. Perret, 2011 .

Superhydrophobic polymeric films with hierarchical structures produced by nanoimprint (NIL) and plasma roughening

C. Gourgon, P. Szkutnik, S. Labau, 2018, Applied Surface Science.

Indium Oxide Nanostructure Optimization for RRAM Integration on CMOS BEOL

D. Deleruyelle, T. Baron, J. Moeyaert, 2018, 2018 IEEE 18th International Conference on Nanotechnology (IEEE-NANO).

Influence of PEN thermal properties on flexible film patterned by nanoimprint lithography

M. Benwadih, J. Bablet, C. Gourgon, 2011 .

Low damage patterning of In0.53Ga0.47As film for its integration as n-channel in a fin metal oxide semiconductor field effect transistor architecture

Mickael Martin, E. Pargon, S. David, 2018, Journal of Vacuum Science & Technology A.

Indium-oxide nanoparticles for RRAM devices compatible with CMOS back-end-off-line

T. Baron, J. Moeyaert, L. Militaru, 2017 .

Preferential crystal orientation etching of GaN nanopillars in Cl2 plasma

E. Pargon, C. Petit-Etienne, S. Labau, 2023, Materials Science in Semiconductor Processing.

Chemical Stability of Si-SiC Nanostructures under Physiological Conditions

V. Stambouli, E. Bano, M. Legallais, 2016, 2016 European Conference on Silicon Carbide & Related Materials (ECSCRM).

Study of structural and electrical properties of ferroelectric HZO films obtained by single-target sputtering

S. Basrour, V. Consonni, A. Bsiesy, 2021, AIP Advances.

Sub-10 nm plasma nanopatterning of InGaAs with nearly vertical and smooth sidewalls for advanced n-fin field effect transistors on silicon

Thierry Baron, Erwine Pargon, Bassem Salem, 2017 .

Synthesis of AlOxNy thin films using a two-step PE-ALD process

E. Martinez, B. Salem, F. Bassani, 2023, AIP Advances.

Smooth plasma etching of GeSn nanowires for gate-all-around field effect transistors

E. Eustache, B. Salem, S. David, 2021, Semiconductor Science and Technology.

Influence of the AZO Electrode on ZnO Nanowire Growth by PLI-MOCVD and Related Piezoelectric Performance: Implications for Mechanical Energy Transducers

G. Ardila, V. Consonni, B. Salem, 2023, ACS Applied Nano Materials.

High Figure-of-Merit in Al-Doped ZnO Thin Films Grown by ALD through the Al Content Adjustment

G. Ardila, V. Consonni, B. Salem, 2023, Materialia.

Plasma-enhanced atomic layer deposition of silicon nitride thin films with different substrate biasing using Diiodosilane precursor

Mohammed Zeghouane, S. Labau, Gauthier Lefevre, 2024, Materials Science in Semiconductor Processing.