Je-Hung Lin

Thermochemical reaction of ZrOx(Ny) interfaces on Ge and Si substrates

Chun-Yen Chang, G. Luo, C. Chien, 2006 .

Study of thermal stability of HfOxNy/Ge capacitors using postdeposition annealing and NH3 plasma pretreatment

Chun-Yen Chang, Chao-Hsin Chien, Chih-Kuo Tseng, 2007 .

Ultrathin Si capping layer suppresses charge trapping in HfOxNy∕Ge metal-insulator-semiconductor capacitors

Chun-Yen Chang, G. Luo, C. Chien, 2007 .