O. Sarroukh

High-brightness EUV light source for HVM

Peter Choi, Keith Powell, Sergey V. Zakharov, 2011, Advanced Lithography.

High-radiance extreme-ultraviolet light source for actinic inspection and metrology

V. S. Zakharov, P. Choi, K. Powell, 2012 .

Dynamics and Emission Characteristics of Xenon Capillary Discharge

C. Fleurier, J. Pouvesle, P. Vrba, 2002 .