V. Samara

发表

Influence of the ion bombardment of O2 plasmas on low-k materials

P. Verdonck, N. Braithwaite, M. Baklanov, 2011 .

Experimental and theoretical study of RF capacitively coupled plasma in Ar–CF4–CF3I mixtures

J. de Marneffe, M. Baklanov, D. Lopaev, 2015 .

Vacuum ultra-violet emission of CF4 and CF3I containing plasmas and Their effect on low-k materials

M. Baklanov, A. Zotovich, J. Marneffe, 2015 .

Advanced CMOS manufacturing, a drive for plasma science and technology

Werner Boullart, Efrain Altamirano Sanchez, Jean-Francois de Marneffe, 2012 .

Influence of O2 or H2O in a plasma jet and its environment on plasma electrical and biochemical performances

S. Ptasińska, V. Samara, Ek R Adhikari, 2018 .

Development of a novel wafer-probe for in situ measurements of thin film properties

J. de Marneffe, M. Bowden, D. Marinov, 2015 .

Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma: modeling and experimental investigation

S. Tinck, J. de Marneffe, A. Bogaerts, 2013 .

Secondary electron emission of carbonaceous dust particles.

I. Stefanović, J. Berndt, E. Kovačević, 2006, Physical review. E, Statistical, nonlinear, and soft matter physics.

Modulation of microwave resonance probes

N. Braithwaite, M. Bowden, V. Samara, 2012 .

Effect of power modulation on properties of pulsed capacitively coupled radiofrequency discharges

N. Braithwaite, M. Bowden, V. Samara, 2010 .

A dc-pulsed capacitively coupled planar Langmuir probe for plasma process diagnostics and monitoring

A. Milenin, W. Boullart, J. Booth, 2012 .

Total yield of reactive species originating from an atmospheric pressure plasma jet in real time

S. Ptasińska, V. Samara, Ek R. Adhikari, 2018, Biological chemistry.

Acoustic characterization of atmospheric-pressure dielectric barrier discharge plasma jets

S. Ptasińska, N. Braithwaite, Y. Sutton, 2020, The European Physical Journal D.

Interferometry of plasma bursts in helium atmospheric-pressure plasma jets

S. Ptasińska, V. Samara, 2018, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films.

In-situ monitoring of etch uniformity using plasma emission interferometry

D. J. Economou, V. Samara, Z. E. Otell, 2015 .

2D micro-chamber for DC plasma working at low power

V. Rochus, P. Soussan, X. Rottenberg, 2014, 2014 15th International Conference on Thermal, Mechanical and Mulit-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE).