W. Harrington

发表

Defect microstructure in single crystal silicon thin films grown at 150° C-305° C by remote plasma-enhanced chemical vapor deposition

C. Magee, B. Anthony, T. Hsu, 1990 .

Ion scattering spectrometry below 10 keV

W. Harrington, Richard E. Hong, 1973 .

On the use of CsX+ cluster ions for major element depth profiling in secondary ion mass spectrometry

Charles W. Magee, C. Magee, William L. Harrington, 1990 .

Determination of Trace Amounts of Carbon, Oxygen, and Nitrogen in Metals by Spark Source Mass Spectrometry.

R. K. Skogerboe, G. Morrison, W. Harrington, 1966 .

Quantitative Spark Source Mass Spectrometry Using Cryosorption Pumping.

R. K. Skogerboe, G. Morrison, W. Harrington, 1965 .

10.6 – SSMS: Spark Source Mass Spectrometry

W. Harrington, 1992 .

Improved Spectral Measurements in Spark Source Mass Spectrometry Using Transmittance Areas.

R. K. Skogerboe, G. Morrison, W. Harrington, 1966 .

Low‐energy ion‐scattering spectrometry (ISS) of the SiO2/Si interface

A. Goodman, Richard Williams, W. Harrington, 1975 .

Depth profiling of sodium in SiO2 films by secondary ion mass spectrometry

C. Magee, W. Harrington, 1978 .

Secondary ion quadrupole mass spectrometer for depth profiling--design and performance evaluation.

C. Magee, C W Magee, W L Harrington, 1978, The Review of scientific instruments.

Sub-100 mn p+/n junction formation using plasma immersion ion implantation

M. Lieberman, N. Cheung, P. Chu, 1991 .