H. Lee

发表

MEMS for In Situ Testing—Handling, Actuation, Loading, and Displacement Measurements

H. Espinosa, M. Haque, H. Lee, 2010 .

Fabrication of High Ordered Nano-sphere Array on Curved Substrate by Nanoimprint Lithography

B. Bae, H. Lee, S. Hong, 2008 .

Cl2-based dry etching of GaN films under inductively coupled plasma conditions

S. Pearton, K. Nahm, Y. Im, 2000 .

NANOSTRUCTURED MATERIALS PRODUCTION BY HYPERSONIC PLASMA PARTICLE DEPOSITION

Peter H. McMurry, P. Mcmurry, J. Heberlein, 1997 .

Selective dry etching of attenuated phase-shift mask materials for extreme ultraviolet lithography using inductively coupled plasmas

N. Lee, J. Ahn, Y. R. Park, 2009 .

Hypersonic plasma particle deposition of nanostructured silicon and silicon carbide

P. Mcmurry, J. Heberlein, S. Girshick, 1998 .

Characterization of Ni/Ge/Au/Ni/Au contact metallization on AlGaAsInGaAs heterostructures for pseudomorphic heterojunction field effect transistor application

Soon Fatt Yoon, M. S. Tse, K. Radhakrishnan, 1995 .

Measurement of the physical and electrical thickness of ultrathin gate oxides

H. Hwang, H. Chang, D. Moon, 2002 .

Fabrication of one-dimensional devices by a combination of AC dielectrophoresis and electrochemical deposition

S. Sull, H. Cha, D. Whang, 2008, Nanotechnology.

Selective wet etching of a GaAsAlxGa1−xAs heterostructure with citric acid-hydrogen peroxide solutions for pseudomorphic GaAs/AlxGa1−xAs/InyGa1−yAs heterojunction field effect transister fabrication

Y. C. Leong, S. Yoon, K. Radhakrishnan, 1995 .

Effects of BCl3 gas on physical damage and Al residues in oxide hard-mask-based Al etching

K. C. Chen, M. Deng, H. Lee, 2007 .