T. Kubo
发表
Y. Wang,
M. Kase,
T. Sukegawa,
2006
.
N. Tamura,
M. Kase,
K. Okabe,
2000,
2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432).
Tomohiro Kubo,
Mitsuru Yamaji,
S. Satoh,
2000,
2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104).
S. Satoh,
T. Yamamoto,
T. Sukegawa,
2007,
2007 15th International Conference on Advanced Thermal Processing of Semiconductors.
T. Yamamoto,
T. Sugii,
H. Ohta,
2007,
2007 IEEE Symposium on VLSI Technology.
Yoshio Kikuchi,
Tomohiro Kubo,
Masataka Kase,
2002
.
M. Kase,
T. Fukuda,
Y. Kikuchi,
1999,
1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144).
Y. Momiyama,
T. Aoyama,
Y. Tagawa,
2006,
IEEE Transactions on Electron Devices.
Y. Momiyama,
T. Aoyama,
Y. Tagawa,
2004,
IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004..
Direct measurement of effects of shallow-trench isolation on carrier profiles in sub-50 nm N-MOSFETs
T. Aoyama,
Y. Nara,
Y. Tagawa,
2005,
Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005..