C. Lindley

A novel two component positive photoresist for deep UV lithography

G. Pawlowski, R. Dammel, C. Lindley, 1990 .

Rate studies of the reactions of the (CH3)2N radical with O2, NO, and NO2

J. H. Shaw, J. Calvert, C. Lindley, 1979 .

Fourier transform infrared kinetic study of hypochlorous acid and its absolute integrated infrared band intensities

J. H. Shaw, W. M. Uselman, J. Calvert, 1979 .

357. Studies on nitroamines. Part VII. The decomposition of methylenedinitroamine in aqueous solutions

C. Lindley, J. Speakman, A. Lamberton, 1949 .