S. Nam

发表

Effect of microwave frequency on breakdown and electron energy distribution function using a global model

J. Verboncoeur, S. Nam, 2008 .

Effect of electron energy distribution function on the global model for high power microwave breakdown at high pressures

J. Verboncoeur, S. Nam, 2008, IVEC 2008.

Dielectric window breakdown in oxygen gas: Global model and particle-in-cell approach

J. Verboncoeur, S. Nam, C. Lim, 2009 .

Transients using low-high pulsed power in inductively coupled plasmas

M. Kushner, S. Nam, Chenhui Qu, 2020 .

Atomistic kinetic Monte Carlo simulation on atomic layer deposition of TiN thin film

Seungwu Han, Sangtae Kim, Jisu Jung, 2022, Computational Materials Science.

Comparison of glancing-angle scatterings on different materials in a high aspect ratio plasma etching process using molecular dynamics simulation

M. Kushner, J. Eapen, S. Shannon, 2022, Journal of Vacuum Science & Technology A.

Power matching to pulsed inductively coupled plasmas

M. Kushner, S. Shannon, S. Nam, 2020 .

Nanopantography: a new method for massively parallel nanopatterning over large areas.

V. M. Donnelly, D. J. Economou, Manish Jain, 2005, Nano letters.

Combined Molecular Dynamics Simulations and Reaction Kinetics Study on Wettability of Trimethylsilyl Functionalized Silicon Surfaces

Hyunhak Jeong, S. Nam, Suyoung Yoo, 2022, Surfaces and Interfaces.

Modulating power delivery in a pulsed ICP discharge via the incorporation of negative feedback mechanisms

Kiho Bae, S. Shannon, S. Nam, 2021, Journal of Applied Physics.

Plasma etching of high aspect ratio features in SiO2 using Ar/C4F8/O2 mixtures: A computational investigation

M. Kushner, S. Shim, I. Song, 2019, Journal of Vacuum Science & Technology A.

Role of sulfur in catalyzing fluorine atom fast etching of silicon with smooth surface morphology

V. M. Donnelly, A. Chawla, P. Arora, 2019 .

Electric field reversals resulting from voltage waveform tailoring in Ar/O2 capacitively coupled plasmas sustained in asymmetric systems

Hyunjae Lee, M. Kushner, S. Nam, 2021 .

Generation of Fast Neutral Beams by Ion Neutralization in High-Aspect-Ratio Holes: A Particle-in-Cell Simulation Study

V. M. Donnelly, D. J. Economou, S. Nam, 2007, IEEE Transactions on Plasma Science.

Theory of filamentary plasma array formation in microwave breakdown at near-atmospheric pressure.

Sang Ki Nam, J. Verboncoeur, John P Verboncoeur, 2009, Physical review letters.

Effect of electron energy distribution function on the global model for high power microwave breakdown at high pressures

J. Verboncoeur, S. Nam, 2008, 2008 IEEE International Vacuum Electronics Conference.

Global Model for High Power Microwave Breakdown at High Pressure

Sang Ki Nam, John P. Verboncoeur, J. Verboncoeur, 2008, 2008 IEEE International Power Modulators and High-Voltage Conference.

Voltage waveform tailoring for high aspect ratio plasma etching of SiO2 using Ar/CF4/O2 mixtures: Consequences of ion and electron distributions on etch profiles

M. Kushner, Hyun-Yong Lee, S. Nam, 2023, Journal of Vacuum Science & Technology A.

Highly selective Si3N4/SiO2etching using an NF3/N2/O2/H2remote plasma. I. Plasma source and critical fluxes

M. Kushner, V. Volynets, S. Nam, 2020 .

Computational approach for plasma process optimization combined with deep learning model

Hyun-Yong Lee, Jungmin Ko, S. Nam, 2023, Journal of Physics D: Applied Physics.

Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma

S. Shannon, S. Nam, Jang-Yeob Lee, 2023, Journal of Vacuum Science & Technology A.

Two-dimensional simulation of a miniaturized inductively coupled plasma reactor

D. J. Economou, S. Nam, 2004 .

Erosion of focus rings in capacitively coupled plasma etching reactors

Hyunjae Lee, M. Kushner, Xifeng Wang, 2021, Journal of Vacuum Science and Technology.

Focus ring geometry influence on wafer edge voltage distribution for plasma processes

S. Shannon, Hoki Lee, S. Nam, 2021, Journal of Vacuum Science & Technology A.

Measurement of localized plasma perturbation with hairpin resonator probes

S. Shannon, S. Nam, D. Walker, 2019, Physics of Plasmas.

Electrode Edge Impedance Design For Rf Bias Cathodes In Plasma Reactors

S. Shannon, S. Nam, Y. Xiao, 2022, 2022 IEEE International Conference on Plasma Science (ICOPS).

Molecular Dynamics Simulation of Silicon Dioxide Etching by Hydrogen Fluoride Using the Reactive Force Field

Won Bo Lee, S. Nam, Suyoung Yoo, 2021, ACS omega.

Improving detection of plasma etching end point using light compensation on optical emission spectra

S. Nam, Dougyong Sung, Jung-min Ko, 2022, Journal of Vacuum Science & Technology B.

Real-time monitoring of atomic layer etching in Cl2/Ar pulsed gas, pulsed power plasmas by optical emission spectroscopy

V. M. Donnelly, S. Nam, Pilbum Kim, 2023, Journal of Vacuum Science & Technology A.

Two-dimensional plasma reactor simulation with self-consistent coupling of gas flow with plasma transport

D. J. Economou, C. Shin, S. Nam, 1999 .

Downstream etching of silicon nitride using continuous-wave and pulsed remote plasma sources sustained in Ar/NF3/O2 mixtures

J. Tennyson, M. Kushner, V. Volynets, 2018 .

Pattern dependent profile distortion during plasma etching of high aspect ratio features in SiO2

M. Kushner, S. Shim, S. Nam, 2020 .

Deep neural network-based reduced-order modeling of ion–surface interactions combined with molecular dynamics simulation

S. Hahn, S. Nam, Suyoung Yoo, 2023, Journal of Physics D: Applied Physics.

Role of NO in highly selective SiN/SiO2 and SiN/Si etching with NF3/O2 remote plasma: Experiment and simulation

V. Volynets, S. Nam, Sangjun Lee, 2017 .

Effects of N2 and O2 plasma treatments of quartz surfaces exposed to H2 plasmas

V. M. Donnelly, Hanyang Li, S. Nam, 2022, Journal of Vacuum Science & Technology A.