Nagesh Shirali

发表

Mask CD relationship to temperature at the time backscatter is received

Takashi Kamikubo, Noriaki Nakayamada, Yukihiro Masuda, 2017, Photomask Japan.

GPU-accelerated inline linearity correction: pixel-level dose correction (PLDC) for the MBM-1000

Noriaki Nakayamada, Yukihiro Masuda, Aki Fujimura, 2017, Photomask Japan.

Adopting curvilinear shapes for production ILT: challenges and opportunities

Aki Fujimura, Ryan Pearman, Leo Pang, 2019, Photomask Technology.

How curvilinear mask patterning will enhance the EUV process window: a study using rigorous wafer+mask dual simulation

Aki Fujimura, Ryan Pearman, Nagesh Shirali, 2019, Photomask Japan.