M. Titus

发表

Comparing 193 nm photoresist roughening in an inductively coupled plasma system and vacuum beam system

D. Graves, D. Nest, M. Titus, 2009 .

Rayleigh fractionation of iron isotopes during pedogenesis along a climate sequence of Hawaiian basalt

O. Chadwick, J. Chorover, A. Thompson, 2007 .

Modelling vacuum ultraviolet photon penetration depth and C=O bond depletion in 193 nm photoresist

D. Graves, D. Nest, M. Titus, 2009 .

Absolute vacuum ultraviolet flux in inductively coupled plasmas and chemical modifications of 193 nm photoresist

D. Graves, D. Nest, M. Titus, 2009 .

Effects of vacuum ultraviolet photons, ion energy and substrate temperature on line width roughness and RMS surface roughness of patterned 193 nm photoresist

David B. Graves, M. J. Titus, D. Graves, 2011 .

''SensArray'' voltage sensor analysis in an inductively coupled plasma

D. Graves, C. Hsu, M. Titus, 2010 .

Measurement and modeling of time- and spatial-resolved wafer surface temperature in inductively coupled plasmas

David B. Graves, M. J. Titus, D. Graves, 2007 .

Use of life-cycle inventory as a screening tool for environmental performance: Supercritical carbon dioxide in the semiconductor industry

Paul Blowers, Monica Titus, P. Blowers, 2004 .