C. Park

Effects of CH2F2 and H2 flow rates on process window for infinite etch selectivity of silicon nitride to ArF PR in dual-frequency CH2F2/H2/Ar capacitively coupled plasmas

H. Mok, C. Park, Ho-Jin Kim, 2008 .

Infinitely High Etch Selectivity of Si3N4 Layer to ArF Photoresist in Dual-Frequency Superimposed Capacitively Coupled Plasmas

C. H. Lee, N. Lee, C. Park, 2007 .

Two-photon-pumped cavity lasing in a dye-solution-filled hollow-fiber system.

J. Bhawalkar, P. Prasad, G. He, 1995, Optics letters.

Comparison of etching characteristics of SiO2 with ArF photoresist in C4F6 and C4F8 based dual-frequency superimposed capacitively coupled plasmas

C. Park, N.-E. Lee, Changhee Lee, 2007 .

Formation of silicon nitride nanopillars in dual-frequency capacitively coupled plasma and their application to Si nanopillar etching

H. T. Kim, D. Kim, C. Park, 2007 .