Jinhyuck Jeon

Layout optimization of DRAM cells using rigorous simulation model for NTD

Donggyu Yim, Thomas Schmoeller, Munhoe Do, 2014, Advanced Lithography.

The impacts of scanner modeling parameters for OPC model of sub-40nm memory device

Donggyu Yim, Sungki Park, Jinhyuck Jeon, 2010, Advanced Lithography.

The improvement of DOF for sub-100nm process by focus scan

Alek C. Chen, Donggyu Yim, James Moon, 2006, SPIE Advanced Lithography.

Study of OPC accuracy by illumination source types

Donggyu Yim, Sungki Park, Daejin Park, 2009, Lithography Asia.

Process window analysis of algorithmic assist feature placement options at the 2X nm node DRAM

Donggyu Yim, Brian Ward, Munhoe Do, 2013, Advanced Lithography.