T. Haimoto

Wafer Handling and Thinning Processes

Toshihiro Ito, E. Yamamoto, T. Haimoto, 2015 .

Dynamics of the Charge Centroid in Metal--Oxide--Nitride--Oxide--Silicon Memory Cells during Avalanche Injection and Fowler--Nordheim Injection Based on Incremental-Step-Pulse Programming

N. Yasuda, M. Koyama, J. Fujiki, 2011 .

Fabrication and characterization of metal-insulator-semiconductor structures by direct nitridation of InP surfaces

M. Takenaka, S. Takagi, T. Hoshii, 2010 .

Dynamics of the Charge Centroid in Metal–Oxide–Nitride–Oxide–Silicon Memory Cells during Avalanche Injection and Fowler–Nordheim Injection Based on Incremental-Step-Pulse Programming

N. Yasuda, M. Koyama, J. Fujiki, 2011 .

Relationships between Interface Structures and Electrical Properties in the High-k/III–V System

M. Takenaka, S. Takagi, M. Yokoyama, 2009 .