W. Lu

Reliable fluorinated thin gate oxides prepared by liquid phase deposition following rapid thermal process

J. Hwu, W. Lu, 1996 .

luorinated Thin Gate Oxides repared by Liqui Phase Deposition Following Rapid Thermal Process

J. Hwu, W. Lu, 1996 .

Radiation hardness of fluorinated oxides prepared by liquid phase deposition method following rapid thermal oxidation

J. Hwu, Si‐Chen Lee, Jenq‐Shiuh Chou, 1994, International Electron Devices and Materials Symposium.

Process control of rapid thermal N2O-annealed thin gate oxides

J. Hwu, Yizhen Huang, W. Lu, 1996 .

A systematic study of the initial electrical and radiation hardness properties of reoxidized nitrided oxides by rapid thermal processing

J. Hwu, W. Lu, C.H. Chan, 1995 .

Direct continuous manufacturing Al–Zn–Mg–Cu alloy from a novel technology of spray-conform

W. Lu, Y. Chen, G. Shao, 2020, Engineering Research Express.