S. Cho

发表

Surface Treatment of Aluminum Sheets by Pulsed Microwave Plasma Discharge at Atmospheric Pressure

H. Uhm, Y. Hong, S. Cho, 2007 .

Elimination of dimethyl methylphosphonate by plasma flame made of microwave plasma and burning hydrocarbon fuel

H. Uhm, Jonghyurk Park, S. Cho, 2008 .

A facile method for the fabrication of super-hydrophobic surfaces and their resulting wettability

H. Uhm, S. Lee, Dong H. Shin, 2008 .

Surface transformation of carbon nanotube powder into super-hydrophobic and measurement of wettability

H. Uhm, Dong H. Shin, Y. Hong, 2006 .

A long plasma column in a flexible tube at atmospheric pressure

H. Uhm, Y. Hong, J. H. Kim, 2007 .

In situ chemical sensing in AlGaN∕GaN metal organic chemical vapor deposition process for precision film thickness metrology and real-time advanced process control

G. Rubloff, M. Aumer, D. Partlow, 2005 .

A Synthesis of Purified Aluminum Fluoride Powder by Atmospheric Microwave-Plasma Torch

H. Uhm, Y. Hong, S. Cho, 2008 .

TeO2 nanoparticles synthesized by evaporation of tellurium in atmospheric microwave-plasma torch-flame

H. Uhm, Y. Hong, S. Cho, 2006 .

Surface modification of polyimide films, filter papers, and cotton clothes by HMDSO/toluene plasma at low pressure and its wettability

H. Uhm, Y. Hong, Soon-Gook Cho, 2009 .

Production of nanocrystalline Y2O3:Eu powder by microwave plasma-torch and its characterization

H. Uhm, C. U. Bang, S. Cho, 2009 .

In situ mass spectrometry in a 10 Torr W chemical vapor deposition process for film thickness metrology and real-time advanced process control

G. Rubloff, L. Henn-Lecordier, S. Cho, 2004 .

Microwave plasma torch operating in a chamber at a low pressure

H. Uhm, Y. Hong, S. Cho, 2008 .

Methane-Augmented Microwave Plasma Burner

H. Uhm, W. Yi, Y. Hong, 2006, IEEE Transactions on Plasma Science.

Hydrophobic Coating of Y2O3:Eu Phosphors by Using HMDSO/Toluene Plasma at Low Pressure and Their Wettability

H. Uhm, Kyung Haeng Lee, C. U. Bang, 2008 .

In situ chemical sensing in AlGaN/GaN high electron mobility transistor metalorganic chemical vapor deposition process for real-time prediction of product crystal quality and advanced process control

G. Rubloff, R. Adomaitis, M. Aumer, 2005 .

Nitrogen-atom endohedral fullerene synthesis with high efficiency by controlling plasma-ion irradiation energy and C60 internal energy

T. Kaneko, R. Hatakeyama, H. Ishida, 2015 .

Microwave plasma burner and temperature measurements in its flames

H. Uhm, W. Yi, Dong H. Shin, 2006 .

Properties of microwave plasma torch operating at a low pressure

H. Uhm, Y. Hong, S. Cho, 2008 .

Destruction of dimethyl methylphosphonate using a microwave plasma torch

H. Uhm, Y. Hong, S. Cho, 2008 .

Microwave plasma torch operating at a low pressure for material processing

Han Sup Uhm, Yong Cheol Hong, H. Uhm, 2009 .

Atmospheric pressure plasma treatment on graphene grown by chemical vapor deposition

Byeong-Joo Lee, Goo-Hwan Jeong, S. Cho, 2015 .

Real-time material quality prediction, fault detection, and contamination control in AlGaN/GaN high electron mobility transistor metalorganic chemical vapor deposition process using in situ chemical sensing

G. Rubloff, M. Aumer, D. Partlow, 2005 .

ZnO nanocrystals synthesized by evaporation of Zn in microwave plasma torch in terms of mixture ratio of N2 to O2

H. Uhm, Y. Hong, J. H. Kim, 2006 .

Hydrophobic coating of carbon nanotubes by CH4 glow plasma at low pressure, and their resulting wettability

H. Uhm, Y. Hong, S. Cho, 2007 .