Jong-Wha Kim

Preparation and characterization of TiO2 thin films by PECVD on Si substrate

C. Youn, Sang‐Kyu Park, Y. Hahn, 1996 .

Effect of rapid thermal annealing on the structural and electrical properties of TiO2 thin films prepared by plasma enhanced CVD

Y. Hahn, Jong-Wha Kim, Do-Oh Kim, 1998 .

Spectroscopic study of an atmospheric pressure plasma generated for the deposition of titanium dioxide thin films

S. Moon, Jong-Wha Kim, Rodolphe Mauchauffé, 2019, Current Applied Physics.

Preparation of PbTiO3 thin films by plasma enhanced MOCVD and the effect of rapid thermal annealing

C. Youn, Y. Hahn, Inhae Lee, 1997 .

Effect of single Al2O3 cycle insertion with various positions in SnO2 thin films using atomic layer deposition

Jong-Woo Kim, H. Jeon, S. Song, 2020 .

Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma

Suhye Park, H. Jeon, S. Song, 2019, Applied Sciences.