R. Reboud

Improved critical temperature of superconducting plasma-enhanced atomic layer deposition of niobium nitride thin films by thermal annealing

A. Mantoux, F. Weiss, G. Berthomé, 2020, Thin Solid Films.

A Chemical Vapor Deposition Route to Epitaxial Superconducting NbTiN Thin Films

G. Renou, M. Hofheinz, E. Sarigiannidou, 2017 .

Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition

A. Mantoux, M. Pons, C. Vallée, 2018, Surface and Coatings Technology.

Growth of aluminum nitride on flat and patterned Si (111) by high temperature halide CVD

G. Ferro, R. Boichot, F. Charlot, 2017 .

Growth of boron nitride films on w‐AlN (0001), 4° off‐cut 4H‐SiC (0001), W (110) and Cr (110) substrates by Chemical Vapor Deposition

R. Boichot, M. Pons, E. Blanquet, 2016 .