K. Benotmane

Ultra-Thin (4nm) Gate-All-Around CMOS devices with High-k/Metal for Low Power Multimedia Applications

Nicolas Loubet, Stephane Monfray, G. Bidal, 2010 .

Hybrid Localized SOI/bulk technology for low power system-on-chip

O. Faynot, G. Ghibaudo, T. Skotnicki, 2010, 2010 Symposium on VLSI Technology.

Thin-film devices for low power applications

Nicolas Loubet, Stephane Monfray, Claire Fenouillet-Beranger, 2010 .

Selective plasma etching of silicon-containing high chi block copolymer for directed self-assembly (DSA) application

M. Argoud, N. Possémé, R. Tiron, 2021, Journal of Vacuum Science & Technology B.

Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography

K. Benotmane, X. Chevalier, C. Nicolet, 2020, Advanced Lithography.