E. N. Zhikharev

发表

Measurement of dimensions of resist mask elements below 100 nm with help of a scanning electron microscope

V. P. Gavrilenko, Yu. A. Novikov, A. V. Rakov, 2009, Advanced Lithography.

Mask image formation by electron beam deposition from vapor phase

V. A. Kal’nov, E. N. Zhikharev, A. V. Spirin, 2008, International Conference on Micro- and Nano-Electronics.

Controlled change of structure and properties of nanometer polymer layers deposited by electron beam polymerization from vapour phase

E. N. Zhikharev, M. A. Bruk, I. A. Volegova, 2006, International Conference on Micro- and Nano-Electronics.

Electron-beam-induced deposition of iron carbon nanostructures from iron dodecacarbonyl vapor

E. I. Grigoriev, V. A. Kal’nov, E. N. Zhikharev, 2004, International Conference on Micro- and Nano-Electronics.

Some peculiarities of the new method of a relief creating by the direct electron-beam etching of resist

V. A. Kal’nov, E. N. Zhikharev, A. V. Spirin, 2014, Other Conferences.

Nanostructure of silicon-carbon composite thin films obtained using magnetron sputtering technique

E. N. Zhikharev, E. Politova, L. Y. Kupriyanov, 2011 .

New type of the nanostructured composite Si/C electrodes

E. N. Zhikharev, T. Kulova, A. Skundin, 2008 .

Investigation of new dry high sensitive resist using 100 kV electron lithography

K. A. Valiev, E. N. Zhikharev, A. Holopkin, 1994 .

Formation of micro- and nanostructures with well-rounded profile by new e-beam lithography principle

E. N. Zhikharev, A. V. Spirin, S. N. Averkin, 2016 .

The new dry method of mask (relief) formation by direct electron-beam etching of resist

E. N. Zhikharev, A. V. Spirin, M. A. Bruk, 2013 .

Lithium insertion into silicon films produced by magnetron sputtering

E. N. Zhikharev, T. Kulova, A. Skundin, 2008 .