Byung-Sup Ahn

Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication

Sungmin Huh, Han-Ku Cho, Hoon Kim, 2009, Advanced Lithography.

Simulation of resist heating effect with e-beam lithography using distributed processing (DP)

Woo-Sung Han, Won-Tai Ki, Byung-Sup Ahn, 2005, Photomask Japan.

The technical consideration of multi-beam mask writer for production

Jin Choi, Shuichi Tamamushi, Chan-Uk Jeon, 2016, Photomask Technology.

Printability and inspectability of programmed pit defects on the masks in EUV lithography

Sungmin Huh, Han-Ku Cho, Iacopo Mochi, 2010, Advanced Lithography.

Absorber stack optimization in EUVL masks: lithographic performances in alpha demo tool and other issues

Tae Geun Kim, Han-Ku Cho, Hoon Kim, 2010, Advanced Lithography.

Effects of mask absorber structures on the extreme ultraviolet lithography

Sungmin Huh, Han-Ku Cho, Eric M. Gullikson, 2008 .