Luke T. Long

Measurement of latent image in resist using scanning probe techniques

Luke T. Long, Andrew R. Neureuther, Patrick P. Naulleau, 2020, Advanced Lithography.

Image denoising for electron beam metrology

Luke T. Long, Patrick P. Naulleau, Andrew R. Neureuther, 2020 .

Three-dimensional modeling of EUV photoresist using the multivariate Poisson propagation model

Luke T. Long, Patrick P. Naulleau, Andrew R. Neureuther, 2021, Journal of Micro/Nanopatterning, Materials, and Metrology.

Spatially-resolved dissolution monitoring using AFM

Luke T. Long, A. Neureuther, P. Naulleau, 2022, International Conference on Extreme Ultraviolet Lithography 2022.

3D modeling of EUV photoresist using the multivariate Poisson propagation model

Luke T. Long, Patrick P. Naulleau, Andrew R. Neureuther, 2021, Advanced Lithography.